- The Classic version.
- Designed to provide real time RF based end point signals for plasma etch or deposition chamber clean in either silicon or flat panel manufacturing.
- Integration with SENSE-RITE® provides highly process correlated measurement data for accurate detection.
- Focused on manufacturing cost reduction and PFC emissions reductions. Normally used for Novellus tools C1 and C2. 8 inch tools and for insitu clean.